NH3对DBD降解SF6影响的试验研究

doi:10.19595/j.cnki.1000-6753.tces.181607

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摘要随着SF₆在电力工业中的大量使用,气体绝缘设备产生的SF₆废气急剧增加,未经处理的SF₆废气会对环境产生严重影响,因此对SF₆进行处理就显得尤为重要。本文基于介质阻挡放电（DBD）等离子体技术在NH₃的协同作用下对SF₆进行降解处理。研究表明：NH₃能够促进SF₆分解,提高SF₆的降解率和降解效率。其中,NH₃和SF₆的体积分数比为11时具有最好的协同促进作用,90W输入功率下可以使体积分数为2%的SF₆在50mL/min的流速下降解率达到97.5%;同时NH₃参与下也会使SF₆分解更加彻底,析出固态S单质、[NH₄]₂SO₄、NH₄F和NH₄HF₂;气体产物主要有SiF₄、SiH₄、SO₂F₂、SO₂、SOF₄、SOF₂、S₂F₁₀、SF₄及氮氧化物（NO_x）等。

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	李亚龙
	张晓星
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	肖焓艳
	张国治

关键词 ：介质阻挡放电（DBD）, NH₃, SF₆, 降解率, 降解产物

Abstract：With the extensive use of SF₆ in the power industry, the SF₆ emission from gas- insulated equipment has also increased dramatically, and untreated SF₆ emission has an adverse impact on the environment. Therefore, it is important to deal with SF₆ waste gas. In this paper, based on the dielectric barrier discharge (DBD) plasma technology, SF₆ was degraded under the synergistic effect of NH₃. Studies have shown that: NH₃ can promote the decomposition process of SF₆, and improve the degradation rate efficiency (DRE) and energy yield (EY). NH₃ and SF₆ show the best synergistic effect when the concentration ratio is 11, and the input power of 90W can make the 2% SF₆ decomposed 97.5% at a flow rate of 50mL/min. At the same time, with NH₃ addition, SF₆ is decomposed more thoroughly, and the solid states S element,[NH₄]₂SO₄, NH₄F and NH₄HF precipitate. Gas products mainly include SiF₄, SiH₄, SO₂F₂, SO₂, SOF₄, SOF₂, S₂F₁₀, SF₄ and nitrogen oxides (NO_x).

Key words： Dielectric barrier discharge (DBD) NH₃ SF₆ degradation rate efficiency (DRE) degradation products

收稿日期: 2018-10-09 出版日期: 2019-12-30

PACS:

TM213

通讯作者: 张晓星，男,1972年生,教授,博士生导师,研究方向为电气设备在线监测与故障诊断、绝缘状态评估、新型传感器技术以及SF₆替代气体等方面研究。E-mail:xiaoxingzhang@whu.edu.cn

作者简介: 李亚龙，男,1989年生,博士研究生,研究方向为气体绝缘电气设备在线监测、SF6环保替代气体、气体放电等离子体等方面研究。E-mail:yalongli1122@whu.edu.cn

引用本文:

李亚龙, 张晓星, 崔兆仑, 肖焓艳, 张国治. NH₃对DBD降解SF₆影响的试验研究[J]. 电工技术学报, 2019, 34(24): 5262-5269. Li Yalong, Zhang Xiaoxing, Cui Zhaolun, Xiao Hanyan, Zhang Guozhi. Experiment of Effect of Ammonia on Degradation of Sulfur Hexafluoride by Dielectric Barrier Discharge. Transactions of China Electrotechnical Society, 2019, 34(24): 5262-5269.

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