电工技术学报  2024, Vol. 39 Issue (zk1): 127-140    DOI: 10.19595/j.cnki.1000-6753.tces.L11008
电气设备检测与诊断 |
电热力耦合下金属化膜自愈数值仿真
王泽, 刘靖舟, 王伟, 吴致远, 齐红斌
华北电力大学高电压与电磁兼容北京市重点实验室 北京 102206
Numerical Simulation of Self-Healing in Metallized Films under Electro-Thermo-Mechanical Coupling
Wang Ze, Liu Jingzhou, Wang Wei, Wu Zhiyuan, Qi Hongbin
Beijing Key Laboratory of High Voltage&EMC North China Electric Power University Beijing 102206 China
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摘要 金属化膜电容器因具有稳定性高、容量大、自愈性能好等特点,在许多电力电子领域中被广泛采用。研究复杂应力下金属化膜自愈微观机理,有助于优化金属化膜电容器制造工艺,提高产品寿命和稳定性。该文搭建了多物理场下金属化膜自愈特性测试平台,展开不同电热力环境下金属化膜自愈试验,表征了自愈面积与自愈形貌,并搭建了多物理场下自愈模型。仿真和试验结果表明:气态与等离子环境下的放电通道形成时间仅为ns级,发展形式与电子崩相似,且放电通道完全贯穿所需的时间与电压和温度成反比,与压强成正比;金属层蒸发面积和等离子化区域大小与施加的电压等级和温度成正比,与压强成反比,在不同电压、温度与压强下等离子化区域均占蒸发面积的43%左右;自愈过程中电介质层的炭化量极少,炭化区域半径和深度与电压、温度成正比,与压强成反比,炭化区域半径约为自愈面积半径的1.6倍,炭化深度约为膜厚的7%,仿真计算结果与相同条件下的自愈试验结果吻合。
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王泽
刘靖舟
王伟
吴致远
齐红斌
关键词 金属化膜电容器双极性载流子-运输模型自愈模型放电通道等离子体炭化    
Abstract:Metalized film capacitors are widely used in many power electronics fields due to their high stability, large capacity, and good self-healing properties. Studying the self-healing micro mechanism of metalized film under complex stress can help optimize the manufacturing process of metalized film capacitors, improve product lifespan, and stability. This article constructs a self-healing characteristic test platform for metalized film under multiple physical fields, conducts self-healing experiments under different electro-thermal environments, characterizes the self-healing area and morphology, In the experiments, a Nanyang MDP5.8 micrometer-thick polypropylene metalized film with an aluminum metal layer was used. The applied voltages on the samples were 1.8 kV, 2.3 kV, 2.8 kV, 3.3 kV, and 3.8 kV. The temperatures were set at 30, 40, 50, 60, and 70°C, and the pressures were 1.8 MPa, 2.3 MPa, 8 MPa, 11 MPa, and 15 MPa. The self-healed samples were observed for morphology using an SOPTOP-SZN71 optical microscope.This article uses COMSOL MULTIPHYSICS 6.2 to build a self-healing model under multiple physical fields to explore the micro and macro characteristics of self-healing in metalized film.
The article first used a bipolar carrier transport model to simulate the phenomenon of charge concentration in weak spots under continuous voltage stress during capacitor operation, calculating the distribution of charges within the material at different times. As charges accumulate, the equivalent current in the weak spot region gradually increases. Once it reaches a certain value, impurities within the metalized film first break down, leading to filamentary discharge within the region. At this point, the discharge channel transitions from solid-state to gaseous, and the simulation model shifts from a solid intrinsic carrier transport model to a gas discharge model. This model is constructed using the plasma model in COMSOL to investigate the effects of different electro-thermal environments on the formation and development of discharge channels. Finally, the electromagnetic coupled thermal module is used to simulate the effects of Joule heating on vaporization and ionization of the metal layer, as well as carbonization of the dielectric layer during the self-healing process of the metalized film under various electro-thermal environments. The model's accuracy is validated by comparing it with previous experimental results.
From the experimental and simulation results, the following conclusions can be drawn: (1) The formation time of the discharge channel is on the order of nanoseconds, and its development is similar to electron avalanche. The time required for the discharge channel to fully penetrate is inversely proportional to the voltage and temperature, and directly proportional to the pressure. (2) During the self-healing process, the temperature of the metal layer can exceed 5 600 K. The ionized region of the metal layer is positively correlated with voltage and temperature, and negatively correlated with pressure. However, the proportion of the ionized region to the self-healing area remains around 43% under different electro-thermal environments. (3) The carbonization of the dielectric layer is minimal during the self-healing process. The carbonized region of the dielectric layer is slightly larger than the self-healing area of the metal layer, but the carbonization depth is only about 0.4 micrometers, roughly 7% of the film thickness. The radius and depth of carbonization are directly proportional to the applied voltage level and temperature, and inversely proportional to the pressure. However, the ratio between the carbonization radius and the self-healing radius remains around 1.6 under different electro-thermal environments.
Key wordsMetallized film capacitor    bipolar carrier transportation model    self-healing model    discharge channel    plasma    carbonization   
收稿日期: 2024-07-06     
PACS: TM215  
基金资助:国家重点研发计划资助项目(2021YFB2401503)
通讯作者: 王 伟 男,1960年生,教授,博士生导师,研究方向为高电压与绝缘技术、先进电工材料等。E-mail:roym19990205@126.com   
作者简介: 王 泽 男,1999年生,硕士研究生,研究方向为高电压与绝缘技术。E-mail:roym19990205@126.com
引用本文:   
王泽, 刘靖舟, 王伟, 吴致远, 齐红斌. 电热力耦合下金属化膜自愈数值仿真[J]. 电工技术学报, 2024, 39(zk1): 127-140. Wang Ze, Liu Jingzhou, Wang Wei, Wu Zhiyuan, Qi Hongbin. Numerical Simulation of Self-Healing in Metallized Films under Electro-Thermo-Mechanical Coupling. Transactions of China Electrotechnical Society, 2024, 39(zk1): 127-140.
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