基于氧同位素示踪法的电晕放电中H2O和O2对SF6分解气体形成的影响

doi:10.19595/j.cnki.1000-6753.tces.180031

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摘要

SF₆气体绝缘电气设备发生放电故障时,SF₆气体将分解为低氟硫化物,并进一步与H₂O、O₂等杂质反应,生成SO₂F₂、SOF₂和SO₂等气体。作为SF₆气体放电的特征产物,H₂O和O₂直接参与SO₂F₂的生成过程,因此SO₂F₂的含量与H₂O和O₂密切相关。为此,本文在工频电晕放电实验基础上,基于氧同位素示踪法,通过注入不同含量的同位素H₂¹⁸O和¹⁸O₂,分析了微量H₂O和O₂对SO₂F₂的三种同位素化合物S¹⁶O₂F₂、S¹⁸O¹⁶OF₂和S¹⁸O₂F₂之间含量比值变化规律的影响,在此基础上进一步解释了SO₂F₂的形成机制。

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	赵明月
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	张国强

关键词 ： SF₆, 电晕放电, SF₆气体分解物, 氧同位素示踪法

Abstract：

SF₆ gas can decompose into lower fluorides of sulfur under electrical discharge, and then these lower fluorides will oxidize in the presence of water vapor and oxygen, resulting in the formation of decomposition by-products such as SO₂F₂, SOF₂ and SO₂. SO₂F₂ is one of the main and stable decomposition by-products of SF₆ gas. Since trace H₂O and O₂ can participate in SF₆ decomposition process directly, the formation of SO₂F₂ is closely related to H₂O and O₂. In this paper, the effects of H₂O and O₂ on SF₆ decomposition characteristics under corona discharge have been investigated based on oxygen isotope tracer method. By injecting different concentrations of H₂¹⁸O and ¹⁸O₂, a series of corona discharge experiments are carried out. Then the concentration ratios of the S¹⁶O₂F₂, S¹⁸O¹⁶OF₂ and S¹⁸O₂F₂ are analyzed respectively, under different concentrations of H₂¹⁸O and the ratios of ¹⁸O₂ to ¹⁶O₂. Finally, the formation mechanism of SO₂F₂ is discussed.

Key words： SF₆ corona discharge SF₆ decomposition by-products oxygen isotope tracer method

收稿日期: 2018-01-11 出版日期: 2018-10-30

PACS:

TM835

基金资助:

国家重点研发计划（2017YFB0902500）和国家自然科学基金（51507165,51477162）资助项目

作者简介: 赵明月女,1993年生,博士研究生,研究方向为SF₆替代气体技术、电力设备故障检测等。E-mail: zhaomy@mail.iee.ac.cn; 韩冬女,1975年生,博士,副研究员,研究方向为SF₆气体分解机理、电力设备故障检测、SF₆替代气体技术等。E-mail: donghan@mail.iee.ac.cn（通信作者）

引用本文:

赵明月, 林涛, 颜湘莲, 韩冬, 张国强. 基于氧同位素示踪法的电晕放电中H₂O和O₂对SF₆分解气体形成的影响[J]. 电工技术学报, 2018, 33(20): 4722-4728. Zhao Mingyue, Lin Tao, Yan Xianglian, Han Dong, Zhang Guoqiang. Influence of Trace H₂O and O₂ on SF₆ Decomposition Characteristics under Corona Discharge Based on Oxygen Isotope Tracer. Transactions of China Electrotechnical Society, 2018, 33(20): 4722-4728.

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