[1] Chu F Y. SF6 decomposition in gas-insulated equipment[J]. IEEE Transactions on Electrical Insulation, 1986, EI-21(5): 693-725.
[2] Van Brunt R J. Production rates for Oxyfluorides SOF2, SO2F2, and SOF4 in SF6 corona discharges[J]. Journal of Research of the National Bureau of Standards (United States), 1985, 90(3): 229-253.
[3] Ding W D, Li G J, Ren X, et al.A comparison of SF6 decomposition characteristics under corona with point- to-plane electrode defect and spark with floating potential defect[J]. IEEE Transactions on Dielectrics and Electrical Insulation, 2015, 22(6): 3278-3289.
[4] 周文俊, 乔胜亚, 李丽, 等. GIS中盆式绝缘子沿面放电的新特征气体CS2[J]. 高电压技术, 2015, 41(3): 848-856.Zhou Wenjun, Qiao Shengya, Li Li, et al. Creeping discharge monitoring of epoxy spacers in GIS using a new target gas CS2[J]. High Voltage Engineering, 2015, 41(3): 848-856.
[5] 齐波, 李成榕, 骆立实, 等. GIS中局部放电与气体分解产物关系的试验[J]. 高电压技术, 2010, 36(4): 957-963.Qi Bo, Li Chengrong, Luo Lishi, et al. Experiment on the correlation between partial discharge and gas decomposition products in GIS[J]. High Voltage Engineering, 2010, 36(4): 957-963.
[6] Han D, Lin T, Zhang G Q, et al.SF6 gas decom- position analysis under point-to-plane 50Hz AC corona discharge[J]. IEEE Transactions on Dielectrics and Electrical Insulation, 2015, 22(2): 799-805.
[7] 汲胜昌, 钟理鹏, 刘凯, 等. SF6放电分解组分分析及其应用的研究现状与发展[J]. 中国电机工程学报, 2015, 35(9): 2318-2332.Ji Shengchang, Zhong Lipeng, Liu Kai, et al. Research status and development of SF6 decom- position components analysis under discharge and its application[J]. Proceedings of the CSEE, 2015, 35(9): 2318-2332.
[8] 唐念, 乔胜亚, 李丽, 等. HF和H2S作为气体绝缘组合电器绝缘缺陷诊断特征气体的有效性[J]. 电工技术学报, 2017, 32(19): 202-211.Tang Nian, Qiao Shengya, Li Li, et al. Validity of HF and H2S as target gases of insulation monitoring in gas insulated switchgear[J]. Transactions of China Electrotechnical Society, 2017, 32(19): 202-211.
[9] Van Brunt R J, Siddagangappa M C. Identification of corona discharge-induced SF6 oxidation mechanisms using SF6/18O2/H216O and SF6/16O2/H218O gas mix- tures[J]. Plasma Chemistry and Plasma Processing, 1988, 8(2): 207-223.
[10] Hergli R, Casanovas J, Derdouri A, et al.Study of the decomposition of SF6 in the presence of water, sub- jected to gamma irradiation or corona discharges[J]. IEEE Transactions on Electrical Insulation, 1988, 23(3): 451-465.
[11] Derdouri A, Casanovas J, Hergli R, et al.Study of the decomposition of wet SF6, subjected to 50Hz AC corona discharges[J]. Journal of Applied Physics, 1989, 65(5): 1852-1857.
[12] 唐炬, 陈长杰, 张晓星, 等. 微氧对SF6局部放电分解特征组份的影响[J]. 高电压技术, 2011, 37(1): 8-14.Tang Ju, Chen Changjie, Zhang Xiaoxing, et al. Study on the influence of trace-level O2 on SF6 decom- position characteristics under partial discharge[J]. High Voltage Technology, 2011, 37(1): 8-14.
[13] 颜湘莲, 王承玉, 季严松, 等. 气体绝缘设备中SF6气体分解产物与设备故障关系的建模[J]. 电工技术学报, 2015, 30(22): 231-238.Yan Xianglian, Wang Chengyu, Ji Yansong, et al. Modeling of the relation between SF6 decomposition products and interior faults in gas insulated equip- ment[J]. Transactions of China Electrotechnical Society, 2015, 30(22): 231-238.
[14] 刘帆. 局部放电下六氟化硫分解特性与放电类型辨识及影响因素校正[D]. 重庆: 重庆大学, 2013.
[15] 唐炬, 裘吟君, 曾福平, 等. 局部放电下微水对SF6分解组分的形成及其影响规律[J]. 电工技术学报, 2012, 27(10): 13-19.Tang Ju, Qiu Yinjun, Zeng Fuping, et al. Formation mechanism and influence rules of trace levels H2O on SF6 characteristic decomposition components under partial discharge[J]. Transactions of China Electro- technical Society, 2012, 27(10): 13-19.
[16] 林涛, 韩冬, 钟海峰, 等. 工频交流电晕放电下SF6气体分解物形成的影响因素[J]. 电工技术学报, 2014, 29(2): 219-225.Lin Tao, Han Dong, Zhong Haifeng, et al. Influence factors of formation of decomposition by-products of SF6 in 50Hz AC corona discharge[J]. Transactions of China Electrotechnical Society, 2014, 29(2): 219-225.
[17] Zeng F P, Tang J, Xie Y B, et al.Experimence study of trace water and oxygen impact on SF6 decom- position characteristics under partial discharge[J]. Journal of Electrical Engineering & Technology, 2015, 10(4): 1787-1796.
[18] Lin T, Han D, Zhang G Q, et al.Influence of trace O2 on SF6 decomposition characteristics under partial discharge based on oxygen isotope tracer[J]. IEEE Transactions on Dielectrics and Electrical Insulation, 2017, 24(3): 1600-1607.
[19] Van Brunt R J, Herron J T. Fundamental processes of SF6 decomposition and oxidation in glow and corona discharges[J]. IEEE Transactions on Electrical Insu- lation, 1990, 25(1): 75-94.
[20] Van Brunt R J, Herron J T. Plasma chemical model for decomposition of SF6 in a negative glow corona discharge[J]. Physica Scripta, 1994, 53(2): 9-29. |