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Power Loss of Power JFET Facing to Low Voltage and High Frequency Switching Application |
Tian Bo, Wu Yu, Huang Huai, Hu Dongqing, Kang Baowei |
Beijing University of Technology Beijing 100124 China |
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Abstract A buried-oxide trench-gate bipolar-mode power JFET (BTB-JFET) facing to low voltage and high frequency switching application is presented. Power loss comparison at high frequency among 20V-rated power switching devices, including BTB-JFET, conventional trench-gate bipolar-mode JFET (TB-JFET) and trench-gate MOSFET (T-MOSFET), is carried out by means of simulation based on static analysis and mixed-mode analysis using an inductive switching circuit for the first time. Simulation results show that the gate-drain capacitance CGD of normally-on BTB-JFET has an improvement up to 25% than that of TB-JFET at zero source-drain bias. Normally-on TB-JFET has at least 14% total power loss improvement at 1MHz and 19% at 2MHz compared to that of the T-MOSFET, while normally-on BTB-JFET can provide 6% more improvement at 1 and 2MHz compared to that of the TB-JFET. Simulation results also show that the normally-off JFET always perform worse than the T-MOSFET at different frequencies. The measurement results of samples still under fabrication show that the CGD of normally-on BTB-JFET has an improvement up to 45% than that of TB-JFET at zero source-drain bias, which accords with simulation.
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Received: 14 July 2008
Published: 17 February 2014
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[1] Ma L, Amali A, Kiyawat S, et al. New trench MOSFET technology for DC-DC converter applications[C]. IEEE 15th ISPSD, Cambridge, UK, 2003: 354-357. [2] Parthasarathy V, Zhu R, Khemka V, et al. A 0.25μm CMOS based 70V smart power technology with deep trench for high-voltage isolation[C]. IEEE IEDM Tech, San Francisco, CA, USA, 2002: 459-462. [3] Hidefumi T, Kyosuke M, Kimimori H, et al. Floating island and thick bottom oxide trench gate MOSFET (FITMOS)[C]. Proceedings of the 17th International Symposium on Power Semiconductor Devices & IC's, Santa Barbara, CA, USA, 2005:1-4. [4] Lovoltech. High performance N-channel vertical power JFET transistor[OL]. Company datasheet, 2003: 1-5. http://www.qspeed.com (formerly http://www. lovol tech. com). [5] Hamza Y. Self-aligned trench MOS junction field- effect transistor for high-frequency applications: US, 6878993 B2[P]. [6] 亢宝位, 吴郁, 田波, 等. 高频低功耗结型场效应晶体管: 中国, 200510132111.9[P]. [7] 田波, 亢宝位, 吴郁, 等. 栅极下加氧化层的新型槽栅E-JFET仿真研究[J]. 电力电子技术, 2007, 41(6): 96-98. [8] Zandt M, Hijzen E, Hueting R, et al. Record-low 4 mΩ·mm2 specific on-resistance for 20V trench MOSFETs[C]. ISPSD’03, Cambridge, UK, 2003: 32-35. [9] Nishizawa J, Yamamoto K. Manufacture of semicon- ductor device: Japan, 56-112760[P]. [10] Nishizawa J, Yoshida T. Static induction transistor: US, 4326209[P]. |
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